Chemical Vapour Deposition Precursors, Processes and Applications

Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). This up-to-date, technically detailed book provides a comprehensive overview on the key aspects of chemical vapour deposition processes. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. An overview of the various aspects of CVD processes are presented, and basic concepts of types of CVD processes, the design of CVD reactors, reaction and reactor modelling, and the chemistry of CVD precursors and of deposition are covered. There is a detailed description of the use of a number of CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed. Chemical Vapour Deposition: Precursors, Processes and Applications has been written with CVD practitioners in mind: the chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. This book will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level.